Substrate preparation methods for improved synthesis of Bi2Se3 films grown on sapphire by molecular beam epitaxy

Bi2Se3 thin films have grown in popularity as three-dimensional topological insulators with a host of potential applications. While the films themselves have been widely researched, improvements derived from better substrate preparation have lagged. In this study, investigations into the preparation of c-plane sapphire (c-sapphire) substrates and the influence on film quality were done. Analysis on the effects of substrate pretreat by ultra-high vacuum annealing of the substrates, the use of Nano-strip® as an etchant, and high temperature in air anneal of c-sapphire to form a terraced morphology on Bi2Se3 thin film growth were done for this study.

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Work Title Substrate preparation methods for improved synthesis of Bi2Se3 films grown on sapphire by molecular beam epitaxy
Access
Open Access
Creators
  1. R. Trice
  2. M. Yu
  3. A. Richardella
  4. M. Hilse
  5. S. Law
Keyword
  1. Hall effect
  2. Ultra-high vacuum
  3. Epitaxy
  4. Atomic force microscopy
  5. Topological insulator
  6. Thin films
License CC BY-NC-ND 4.0 (Attribution-NonCommercial-NoDerivatives)
Work Type Article
Acknowledgments
  1. DMR-2039351
Publisher
  1. Journal of Vacuum Science and Technology A
Publication Date April 24, 2025
Publisher Identifier (DOI)
  1. https://doi.org/10.1116/6.0004429
Deposited April 24, 2025

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Version 1
published

  • Created
  • Updated
  • Updated
  • Updated Publisher Identifier (DOI), Description, Publication Date Show Changes
    Publisher Identifier (DOI)
    • 10.1116/6.0004429
    Description
    • Bi2Se3 thin films have grown in popularity as three-dimensional topological insulators with a host of potential applications. While the films themselves have been widely researched, improvements derived from better substrate preparation have lagged. In this study, investigations into the preparation of c-plane sapphire (c-sapphire) substrates and the influence on film quality were done. Analysis on the effects of substrate pretreat by ultra-high vacuum annealing of the substrates, the use of Nano-strip® as an etchant, and high temperature in air anneal of c-sapphire to form a terraced morphology on Bi2Se3 thin film growth were done for this study.
    Publication Date
    • 2025-04
  • Updated Acknowledgments Show Changes
    Acknowledgments
    • DMR-2039351
  • Added Creator Ryan Trice
  • Added Creator Mingyu Yu
  • Added Creator Anthony Raymond Richardella
  • Added Creator Maria Hilse
  • Added Creator Stephanie Law
  • Added JVA25-AR-MBE2025-00068.pdf
  • Updated
  • Updated License Show Changes
    License
    • https://creativecommons.org/licenses/by-nc-nd/4.0/
  • Published
  • Updated
  • Updated Keyword, Publisher, Publisher Identifier (DOI), and 1 more Show Changes
    Keyword
    • Hall effect, Ultra-high vacuum, Epitaxy, Atomic force microscopy, Topological insulator, Thin films
    Publisher
    • Journal of Vacuum Science and Technology A
    Publisher Identifier (DOI)
    • 10.1116/6.0004429
    • https://doi.org/10.1116/6.0004429
    Publication Date
    • 2025-04
    • 2025-04-24
  • Renamed Creator R. Trice Show Changes
    • Ryan Trice
    • R. Trice
  • Renamed Creator M. Yu Show Changes
    • Mingyu Yu
    • M. Yu
  • Renamed Creator A. Richardella Show Changes
    • Anthony Raymond Richardella
    • A. Richardella
  • Renamed Creator M. Hilse Show Changes
    • Maria Hilse
    • M. Hilse
  • Renamed Creator S. Law Show Changes
    • Stephanie Law
    • S. Law