An effective lithography training module adapting semianalytical calculation approaches

A complete, self-sufficient package is prepared to teach the fundamental concepts of lithography. The adapted semianalytical approaches promise to illustratively create an ideal engaging environment for efficiently training next generation lithographers. The presented educational tool, which integrates the well-known modeling methods from the literature, is shown to capture the photolithography process step by step while offering the students a remote, hands-on feeling from introductory to graduate-level work. The importance of optical and chemistry related parameters are discussed with the aim of creating a useful laboratory assessment package for the educators to be easily integrated into their curriculum.

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Work Title An effective lithography training module adapting semianalytical calculation approaches
Access
Open Access
Creators
  1. Atilla Ozgur Cakmak
  2. Evrim Colak
  3. Osama O. Awadelkarim
Keyword
  1. Critical dimension
  2. Lithography
  3. Nanopatterning
  4. Parametric analysis
  5. Remote teaching
  6. Simulation
License In Copyright (Rights Reserved)
Work Type Article
Publisher
  1. Journal of the Society for Information Display
Publication Date July 1, 2021
Publisher Identifier (DOI)
  1. https://doi.org/10.1002/jsid.1067
Deposited February 26, 2024

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Version 1
published

  • Created
  • Added J_Soc_Info_Display_-_2021_-_Cakmak_-_An_effective_lithography_training_module_adapting_semianalytical_calculation.pdf
  • Added Creator Atilla Ozgur Cakmak
  • Added Creator Evrim Colak
  • Added Creator Osama O. Awadelkarim
  • Published
  • Updated Keyword, Publication Date Show Changes
    Keyword
    • Critical dimension, Lithography, Nanopatterning, Parametric analysis, Remote teaching, Simulation
    Publication Date
    • 2021-11-01
    • 2021-07-01
  • Updated