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Created
November 14, 2023 10:23
by
rkh24
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Updated
November 14, 2023 10:23
by
[unknown user]
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November 14, 2023 10:25
by
rkh24
Acknowledgments
- NSF Cooperative Agreement DMR-2039351
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Added Creator Chen Chen
November 14, 2023 10:25
by
rkh24
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Added Creator Joan Redwing
November 14, 2023 10:25
by
rkh24
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Added
MCV1-220706A-MC.zip
November 14, 2023 10:26
by
rkh24
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Added
MCV1-220630A-CC.zip
November 14, 2023 10:26
by
rkh24
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November 14, 2023 10:27
by
rkh24
License
- https://creativecommons.org/licenses/by/4.0/
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November 14, 2023 16:52
by
cuc33
Description
- This data package includes detailed information on growth conditions and characterization results for the study of the "Structure-Property-Processing Correlations of MoS2 Grown via Distinct Metalorganic Chemical Vapor Deposition Reactor Geometries" conducted in Professor Dave Estrada's group at Boise State University.
Both MoS2 monolayer samples, MCV1-220630A-CC and MCV1-220706A-MC in this study were grown by metalorganic chemical vapor deposition (MOCVD) on 2" c-plane sapphire substrates in the NSF 2D Crystal Consortium facility at Penn State University. It includes the growth recipes from the MOCVD system and data files from atomic force microscopy (AFM), field-emission scanning electron microscopy (FESEM), room temperature photoluminescence (PL), and Raman spectroscopy, In-plane X-ray diffraction (XRD) carried out on the samples. Note that AFM, room temperature PL and Raman Characterization are typically done at the center of the 2" wafer and near the wafer edge (approximately 5 mm from the wafer edge on the opposite side to the flat).
- Both MoS2 monolayer samples, MCV1-220630A-CC and MCV1-220706A-MC in this study were grown by metalorganic chemical vapor deposition (MOCVD) on 2" c-plane sapphire substrates in the NSF 2D Crystal Consortium facility at Penn State University. It includes the growth recipes from the MOCVD system and data files from atomic force microscopy (AFM), field-emission scanning electron microscopy (FESEM), room temperature photoluminescence (PL), and Raman spectroscopy, In-plane X-ray diffraction (XRD) carried out on the samples. Note that AFM, room temperature PL and Raman Characterization are typically done at the center of the 2" wafer and near the wafer edge (approximately 5 mm from the wafer edge on the opposite side to the flat).
- Additional details are provided in the 2DCC LiST database: https://m4-2dcc.vmhost.psu.edu/list/data/45
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Updated Creator Joan Redwing
November 14, 2023 16:53
by
cuc33
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Updated Creator Chen Chen
November 14, 2023 16:53
by
cuc33
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November 14, 2023 16:56
by
cuc33
Description
- This data package includes detailed information on growth conditions and characterization results for the study of the "Structure-Property-Processing Correlations of MoS2 Grown via Distinct Metalorganic Chemical Vapor Deposition Reactor Geometries" conducted in Professor Dave Estrada's group at Boise State University.
Both MoS2 monolayer samples, MCV1-220630A-CC and MCV1-220706A-MC in this study were grown by metalorganic chemical vapor deposition (MOCVD) on 2" c-plane sapphire substrates in the NSF 2D Crystal Consortium facility at Penn State University. It includes the growth recipes from the MOCVD system and data files from atomic force microscopy (AFM), field-emission scanning electron microscopy (FESEM), room temperature photoluminescence (PL), and Raman spectroscopy, In-plane X-ray diffraction (XRD) carried out on the samples. Note that AFM, room temperature PL and Raman Characterization are typically done at the center of the 2" wafer and near the wafer edge (approximately 5 mm from the wafer edge on the opposite side to the flat).
- Both MoS2 monolayer samples, MCV1-220630A-CC and MCV1-220706A-MC in this study were grown by metalorganic chemical vapor deposition (MOCVD) on 2" c-plane sapphire substrates in the NSF 2D Crystal Consortium facility at Penn State University. It includes the growth recipes from the MOCVD system and data files from atomic force microscopy (AFM), room temperature photoluminescence (PL), and Raman spectroscopy carried out on the samples. Note that AFM, room temperature PL and Raman Characterization are typically done at the center of the 2" wafer and near the wafer edge (approximately 5 mm from the wafer edge on the opposite side to the flat).
- Additional details are provided in the 2DCC LiST database: https://m4-2dcc.vmhost.psu.edu/list/data/45
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November 14, 2023 17:39
by
cuc33
Work Title
Structure-Property-Processing Correlations of MoS2 Grown via Distinct Metalorganic Chemical Vapor Deposition Reactor Geometries
- Monolayer MoS2 grown by MOCVD on sapphire for reactor comparison study
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Published
November 14, 2023 17:39
by
cuc33
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Updated
April 04, 2024 10:22
by
[unknown user]