Substrate preparation methods for improved synthesis of Bi2Se3 films grown on sapphire by molecular beam epitaxy

Bi2Se3 thin films have grown in popularity as three-dimensional topological insulators with a host of potential applications. While the films themselves have been widely researched, improvements derived from better substrate preparation have lagged. In this study, investigations into the preparation of c-plane sapphire (c-sapphire) substrates and the influence on film quality were done. Analysis on the effects of substrate pretreat by ultra-high vacuum annealing of the substrates, the use of Nano-strip® as an etchant, and high temperature in air anneal of c-sapphire to form a terraced morphology on Bi2Se3 thin film growth were done for this study.

Citation

Trice, Ryan; Law, Stephanie; Richardella, Anthony; Hilse, Maria; Yu, Mingyu (2025). Substrate preparation methods for improved synthesis of Bi2Se3 films grown on sapphire by molecular beam epitaxy [Data set]. Scholarsphere. https://doi.org/10.26207/67wx-fx48

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Work Title Substrate preparation methods for improved synthesis of Bi2Se3 films grown on sapphire by molecular beam epitaxy
Access
Open Access
Creators
  1. Ryan Trice
  2. Stephanie Law
  3. Anthony Raymond Richardella
  4. Maria Hilse
  5. Mingyu Yu
License CC BY 4.0 (Attribution)
Work Type Dataset
Publisher
  1. 2D Crystal Consortium
Publication Date 2025
Subject
  1. Materials Science
DOI doi:10.26207/67wx-fx48
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Deposited April 11, 2025

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  • Updated Description, Publication Date Show Changes
    Description
    • a) Electronic mail: sal6149@psu.edu
    • Bi2Se3 thin films have grown in popularity as three-dimensional topological insulators with a host of potential applications. While the films themselves have been widely researched, improvements derived from better substrate preparation have lagged. In this study, investigations into the preparation of c-plane sapphire (c-sapphire) substrates and the influence on film quality were done. Analysis on the effects of substrate pretreat by ultra-high vacuum annealing of the substrates, the use of Nano-strip® as an etchant, and high temperature in air anneal of c-sapphire to form a terraced morphology on Bi2Se3 thin film growth were done for this study.
    Publication Date
    • 2025
  • Added Creator Ryan Trice
  • Added Creator Stephanie Law
  • Added Creator Anthony Raymond Richardella
  • Added Creator Maria Hilse
  • Added Creator Mingyu Yu
  • Updated Subject, Publisher, Description, and 1 more Show Changes
    Subject
    • Materials Science
    Publisher
    • 2D Crystal Consortium
    Description
    • a) Electronic mail: sal6149@psu.edu
    • Bi2Se3 thin films have grown in popularity as three-dimensional topological insulators with a host of potential applications. While the films themselves have been widely researched, improvements derived from better substrate preparation have lagged. In this study, investigations into the preparation of c-plane sapphire (c-sapphire) substrates and the influence on film quality were done. Analysis on the effects of substrate pretreat by ultra-high vacuum annealing of the substrates, the use of Nano-strip® as an etchant, and high temperature in air anneal of c-sapphire to form a terraced morphology on Bi2Se3 thin film growth were done for this study.
    Related URLs
    • https://pennstateoffice365.sharepoint.com/:f:/s/2DCC-Data/EnY1i7mHpQBEr68IWa8-zgIBfwicMbxy_hT2H9oSuQ7duw
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  • Updated License Show Changes
    License
    • https://creativecommons.org/licenses/by/4.0/
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