
Electron beam evaporated Au islands as a nanoscale etch mask on few-layer MoS2 and fabrication of top-edge hybrid contacts for field-effect transistors
Accepted version prior to typesetting for the following paper:
Electron beam evaporated Au islands as a nanoscale etch mask on few-layer MoS2 and fabrication of top-edge hybrid contacts for field-effect transistors, 2021 Nanotechnology 32 025203, https://doi.org/10.1088/1361-6528/abbb4a
Accepted version prior to typesetting for the following paper:
Electron beam evaporated Au islands as a nanoscale etch mask on few-layer MoS2 and fabrication of top-edge hybrid contacts for field-effect transistors, 2021 Nanotechnology 32 025203, https://doi.org/10.1088/1361-6528/abbb4a
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Work Title | Electron beam evaporated Au islands as a nanoscale etch mask on few-layer MoS2 and fabrication of top-edge hybrid contacts for field-effect transistors |
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License | In Copyright (Rights Reserved) |
Work Type | Article |
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Publication Date | 2020 |
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Deposited | December 21, 2021 |
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