Molybdenum Carbonitride Deposited by Plasma Atomic Layer Deposition as a Schottky Contact to Gallium Nitride

This is the author’s peer reviewed, accepted manuscript. However, the online version of record will be different from this version once it has been copyedited and typeset.

PLEASE CITE THIS ARTICLE AS DOI: 10.1063/5.0062140

This is the author’s peer reviewed, accepted manuscript. However, the online version of record will be different from this version once it has been copyedited and typeset.

PLEASE CITE THIS ARTICLE AS DOI: 10.1063/5.0062140

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Work Title Molybdenum Carbonitride Deposited by Plasma Atomic Layer Deposition as a Schottky Contact to Gallium Nitride
Access
Open Access
Creators
  1. Alex Molina
  2. Ian Edward Campbell
  3. Timothy N. Walter
  4. Ama Agyapong
  5. Suzanne Mohney
Keyword
  1. atomic layer deposition, molybdenum nitride, molybdenum carbonitride, gallium nitride, GaN, Schottky barrier
License In Copyright (Rights Reserved)
Work Type Article
Acknowledgments
  1. The authors are grateful to Andrew Allerman (Sandia National Laboratories) for providing GaN epilayers. The authors are also grateful to Jennifer Gray in the Penn State Materials Characterization Laboratory for imaging the cross-sectional TEM sample and Jeffrey Shallenberger for helpful discussions about XPS. This work was funded by the Office of Naval Research under Grant N000141812360. AM would also like to thank the Alfred P. Sloan Foundation for additional partial support through the Sloan Minority Ph.D. Program (MPHD).
Publisher
  1. Applied Physics Letters
Publication Date 2021
Language
  1. English
Publisher Identifier (DOI)
  1. 10.1063/5.0062140
Deposited December 21, 2021

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  • Created
  • Updated Acknowledgments Show Changes
    Acknowledgments
    • The authors are grateful to Andrew Allerman (Sandia National Laboratories) for providing GaN epilayers. The authors are also grateful to Jennifer Gray in the Penn State Materials Characterization Laboratory for imaging the cross-sectional TEM sample and Jeffrey Shallenberger for helpful discussions about XPS. This work was funded by the Office of Naval Research under Grant N000141812360. AM would also like to thank the Alfred P. Sloan Foundation for additional partial support through the Sloan Minority Ph.D. Program (MPHD).
  • Added Creator Suzanne Mohney
  • Added Molybdenum Carbonitride Deposited by Plasma Atomic Layer Deposition as a Schottky Contact to Gallium Nitride.pdf
  • Added Creator Alex Molina
  • Added Creator Ian Edward Campbell
  • Added Creator Ama Agyapong
  • Added Creator Timothy N. Walter
  • Updated Creator Alex Molina
  • Updated Creator Suzanne Mohney
  • Updated Creator Ian Edward Campbell
  • Updated Creator Timothy N. Walter
  • Updated License Show Changes
    License
    • https://rightsstatements.org/page/InC/1.0/
  • Published
  • Updated